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dc.contributor.authorOliveira, A.C. dept_BR
dc.contributor.authorFreitas Jr., J.A.pt_BR
dc.contributor.authorMoore, W.J.pt_BR
dc.contributor.authorSilva, A. Ferreira dapt_BR
dc.contributor.authorPepe, I.pt_BR
dc.contributor.authorAlmeida, J. Souza dept_BR
dc.contributor.authorOsório-Guillén, J.M.pt_BR
dc.contributor.authorAhuja, R.pt_BR
dc.contributor.authorPersson, C.pt_BR
dc.contributor.authorJärrendahl, K.pt_BR
dc.contributor.authorLindquist, O.P.A.pt_BR
dc.contributor.authorEdwards, N.V.pt_BR
dc.contributor.authorWahab, Q.pt_BR
dc.date.accessioned2017-12-07T04:38:39Z-
dc.date.available2017-12-07T04:38:39Z-
dc.date.issued2003pt_BR
dc.identifier.citationMat. Res.,v.6,n.1,p.43-45,2003pt_BR
dc.identifier.urihttp://repositorio.unb.br/handle/10482/26099-
dc.description.abstractCalculations of the total dielectric functions and the optical bandgap energy (OBGE) of 4HSiC were performed by the full-potential linear muffin-tin-orbital method. The results are compared to spectroscopic ellipsometry dielectric measurements agreeing closely over in a wide range of energies. The obtained theoretical value of the (OBGE) agrees very closely with the measured ones obtained by transmission and photoacoustic spectroscopies at room temperature performed on 470 µm thick wafer and a 25 µm thick homoepitaxial layer of 4H-SiC samples grown (n-type, Siface) by hot wall CVD.pt_BR
dc.language.isoenpt_BR
dc.publisherABM, ABC, ABPolpt_BR
dc.rightsAcesso Abertopt_BR
dc.titleSpectroscopy studies of 4H-SiCpt_BR
dc.typeArtigopt_BR
dc.subject.keywordEnergia ópticapt_BR
dc.subject.keywordMaterial wide-bandgappt_BR
dc.subject.keywordPolítipos sicpt_BR
dc.subject.keywordSimulação computacionalpt_BR
dc.identifier.doihttps://dx.doi.org/10.1590/S1516-14392003000100008pt_BR
dc.description.unidadeEm processamento-
Appears in Collections:Artigos publicados em periódicos e afins

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